Published by Global Banking & Finance Review®
Posted on April 16, 2026
1 min readLast updated: April 16, 2026
Add as preferred source on GoogleAir Liquide will invest around €200 million (~$236 million) to build and operate two ultra‑high‑purity gas plants in Hiroshima by end‑2028, supplying nitrogen, oxygen and argon to support next‑generation AI chip manufacturing in Japan.
April 16 (Reuters) - Air Liquide said on Thursday it would invest 200 million euros ($236 million) in Japan to build, own and operate two new industrial gas production units in Hiroshima, under a long-term agreement with a global semiconductor leader expanding its advanced chip manufacturing capacity.
The French industrial gases group said the plants, due to start up by the end of 2028, would supply large volumes of ultra-high-purity nitrogen, oxygen and argon used in the production of next-generation chips for artificial intelligence applications.
Air Liquide, which has operated in Japan for more than a century, said the investment would strengthen its position in the country's semiconductor industry and help support rising global demand for advanced chips.
($1 = 0.8477 euros)
(Reporting by Olivier Cherfan in Gdansk, editing by Milla Nissi-Prussak)
Air Liquide is investing 200 million euros ($236 million) to build two new industrial gas plants in Hiroshima, Japan.
The plants will supply ultra-high-purity nitrogen, oxygen, and argon for next-generation AI chip production.
The new plants are due to start up by the end of 2028.
Air Liquide is partnering with a global semiconductor leader to support advanced chip manufacturing in Japan.
The investment will strengthen Air Liquide's position in Japan and support growing worldwide demand for advanced AI chips.
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